Number of the records: 1
An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science
Title statement An introduction to time-of-flight secondary ion mass spectrometry (ToF-SIMS) and its application to materials science / Sarah Fearn. [elektronický zdroj] Publication San Rafael [California] (40 Oak Drive, San Rafael, CA, 94903, USA) : Morgan & Claypool Publishers, [2015] Distribution Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) : IOP Publishing, [2015] Phys.des. 1 online resource (various pagings) : illustrations (some color). ISBN 9781681740881 (online) 9781681742168 mobi Edition [IOP release 2] IOP concise physics, ISSN 2053-2571 Note "Version: 20151001"--Title page verso. "A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso. Internal Bibliographies/Indexes Note Includes bibliographical references. Contents Preface -- Author biography -- 1. Introduction -- 1.1. Overview -- 1.2. Basic principles Content note 2. Practical requirements -- 2.1. Ion generation -- 2.2. Primary and sputter ion beam sources -- 2.3. Mass analysis -- 2.4. Ion detection -- 2.5. Ultra high vacuum. 3. Modes of analysis -- 3.1. High-resolution mass spectra -- 3.2. Depth profiling. 4. Ion beam-target interactions -- 4.1. Ion beam induced atomic mixing -- 4.2. Beam induced surface roughening and uneven etching -- 4.3. Beam induced segregation -- 4.4. Other beam induced effects -- 4.5. Depth profiling with cluster ion beams. 5. Application to materials science -- 5.1. Biomaterials and tissue studies -- 5.2. Glass corrosion -- 5.3. Ceramic oxides -- 5.4. Semiconductor analysis -- 5.5. Organic electronics -- 6. Summary. Notes to Availability Přístup pouze pro oprávněné uživatele Audience Materials scientists, researchers and engineers. Note Způsob přístupu: World Wide Web.. Požadavky na systém: Adobe Acrobat Reader. Another responsib. Morgan & Claypool Publishers, Institute of Physics (Great Britain), Subj. Headings Secondary ion mass spectrometry. * Time-of-flight mass spectrometry. * Materials science. * Microscopy. * TECHNOLOGY & ENGINEERING / Measurement. Form, Genre elektronické knihy electronic books Country Kalifornie Language angličtina Document kind Electronic books URL Plný text pro studenty a zaměstnance UPOL 
book
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
Preface -- Author biography -- 1. Introduction -- 1.1. Overview -- 1.2. Basic principles2. Practical requirements -- 2.1. Ion generation -- 2.2. Primary and sputter ion beam sources -- 2.3. Mass analysis -- 2.4. Ion detection -- 2.5. Ultra high vacuum3. Modes of analysis -- 3.1. High-resolution mass spectra -- 3.2. Depth profiling4. Ion beam-target interactions -- 4.1. Ion beam induced atomic mixing -- 4.2. Beam induced surface roughening and uneven etching -- 4.3. Beam induced segregation -- 4.4. Other beam induced effects -- 4.5. Depth profiling with cluster ion beams5. Application to materials science -- 5.1. Biomaterials and tissue studies -- 5.2. Glass corrosion -- 5.3. Ceramic oxides -- 5.4. Semiconductor analysis -- 5.5. Organic electronics -- 6. Summary.
Number of the records: 1